Vacuum kiln（Firing of ALN substrates and MIM components）
Use：Firing of ALN substrates and MIM components
Max temperature：2000℃
Chamber dimension：L1800×W300×H300mm
Atmosphere：N₂ Vacuum
Heating elements：Graphite
Key words:
Classification:
Product Details
Related Content
We aim to win the market with high-quality products and win customers with honest service.
Leave a message for your needs.
Please feel free to leave us a message if you have any questions, and we will contact you as soon as possible.
Suzhou Huike Technology Co., Ltd.
Address: Xinzhuang Industrial Development Zone, Changshu City, Jiangsu Province (Yangyuan)
Copyright: Suzhou Huike Technology Co., Ltd.
SEO Tags Designed By:www.300.cn
Business License
Website Sharing
Contact Information
Focus on
